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Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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Reactive sputtering Al2O3
Dušek, Jan ; Boušek, Jaroslav (referee) ; Fořt, Tomáš (advisor)
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Furthermore it deals with design of deposition process and testing new aluminium target. The technological window was determined by tests. As a result, it was possible to create Al2O3 coatings in the widest possible working range. The coatings created by apparatus PLS 160 were tested for optical properties in order to obtain transmittance. Besides the optical tests, the evaluation of mechanical properties and adhesion were performed. The obtained results from measurement were evaluated. Based on the results, some possible applications of the coating were suggested.
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Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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Probe methods for diagnostics of plasmatic systems for deposition of thin films
Zanáška, Michal ; Tichý, Milan (advisor) ; Dvořák, Pavel (referee) ; Straňák, Vítězslav (referee)
The doctoral thesis deals with an experimental study of several diagnostic techniques intended for plasma diagnostics and diagnostics of thin films during reactive sputter deposition. A relatively novel probe diagnostic technique called Floating harmonic probe for measurement of the ion density and electron tem- perature in technological low-temperature plasma is studied. A Langmuir probe is commonly used, however, its application in conditions where non-conducting films are being deposited can be problematic or unreliable. The floating harmonic probe measurement technique deals with this inherent problem of the Langmuir probe. The Floating harmonic probe results are compared to those obtained by a classical Langmuir probe in non-reactive DC continuously driven discharge, and its applicability in reactive regime during deposition of iron oxide thin films is proved. The work deals also with a modification of the Floating harmonic probe called Phase Delay Harmonic Analysis Method which is intended for diagnostics of pulsed driven discharges. The second part of the thesis is devoted to a new proposed method for in-situ diagnostics of thin films. This method monitors the capacitance and resistance of a thin film during deposition up to the frequencies in the kHz range. This new method could be used for...
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Probe methods for diagnostics of plasmatic systems for deposition of thin films
Zanáška, Michal ; Tichý, Milan (advisor) ; Dvořák, Pavel (referee) ; Straňák, Vítězslav (referee)
The doctoral thesis deals with an experimental study of several diagnostic techniques intended for plasma diagnostics and diagnostics of thin films during reactive sputter deposition. A relatively novel probe diagnostic technique called Floating harmonic probe for measurement of the ion density and electron tem- perature in technological low-temperature plasma is studied. A Langmuir probe is commonly used, however, its application in conditions where non-conducting films are being deposited can be problematic or unreliable. The floating harmonic probe measurement technique deals with this inherent problem of the Langmuir probe. The Floating harmonic probe results are compared to those obtained by a classical Langmuir probe in non-reactive DC continuously driven discharge, and its applicability in reactive regime during deposition of iron oxide thin films is proved. The work deals also with a modification of the Floating harmonic probe called Phase Delay Harmonic Analysis Method which is intended for diagnostics of pulsed driven discharges. The second part of the thesis is devoted to a new proposed method for in-situ diagnostics of thin films. This method monitors the capacitance and resistance of a thin film during deposition up to the frequencies in the kHz range. This new method could be used for...
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Reactive sputtering Al2O3
Dušek, Jan ; Boušek, Jaroslav (referee) ; Fořt, Tomáš (advisor)
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Furthermore it deals with design of deposition process and testing new aluminium target. The technological window was determined by tests. As a result, it was possible to create Al2O3 coatings in the widest possible working range. The coatings created by apparatus PLS 160 were tested for optical properties in order to obtain transmittance. Besides the optical tests, the evaluation of mechanical properties and adhesion were performed. The obtained results from measurement were evaluated. Based on the results, some possible applications of the coating were suggested.
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